Process Induced Defects: Large View of Haze and Stacking Faults

	Stacking faults		Haze
	The stacking faults are shown by a grove along their intersection with the surface, always bound by two deep etch pits denoting the Frank partials bounding the stacking fault.		Classical "Haze". Small etch pits in rather large density denote metal precipitates. The "Tweezer marks" in the other set of pictures are haze, too, but at the edge of the detection limit.
	Back to overview

To index

Process-Induced Defects in Silicon Wafers

Process-Induced Defects: Large View of Tweezer Marks and Dislocations

© H. Föll